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產(chǎn)品應(yīng)用/Product Applications: ?適用領(lǐng)域:?jiǎn)尉L(zhǎng) Relevant Industries:Single Crystal Growth ?適用材料:Ga2O3、GaAs等 Suitable for Processing: Ga2O3 (Gallium Oxide),GaAS(Gallium Arsenide), etc. ?晶圓尺寸:12/8/6英寸 Wafer Size: 12/8/6 inch 技術(shù)指標(biāo)/Technical Indicators: ?制程溫度范圍:2200°C Process Temperature Range:2200°C ?加熱方式:感應(yīng)/電阻 Heating Method:Induction/Resistance